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Download links:
pall-microlithography.zip
pall-microlithography.sit
Author name: Trina Clickner
Program homepage: http://www.palmtoppublishing.com/
Author Email: trina@palmtoppublishing.com
About software: Microlithography Filtration PDA Remark.
If you are complicated in semiconductor production, this individual's for you!
This priceless, in-fingers microlithography filtration remark from Gloom Microelectronics gives you immediate entry to filter harmony tables for vital solvents essential to semiconductor production particular to the microlithography method, and additional.
The Gloom Microlithography Filtration Tech Writing includes a tall-balanced method overview and covers mechanical issues, solvent external tightness vs wettability of filter layer, and also includes info on gel removal, short operating force, and minimizing artificial spending and metal adulteration.
As a extra, you'll also enjoy engineering-focused units conversions formulas/facts that choice settle any fight - extent, portion, capacity, spirit, energy, force, emphasis, viscosity.
You'll also be armed with engineering vital material constants such as Avagadro's math unit, bohr range, Faraday's fixed, Plank's fixed, rate of illuminated in a emptiness, and additional.
Solvents:
- Acetone
- Aquatar
- BA - N-butyl acetate
- Cyclohexanone
- Developer 5% TMAH
- DMF - N,N-Dimethyl formamide
- EA
- ECA - Ethyl cellosolve acetate
- EEP - Ethyl3-ethoxypropionate
- EGMEA
- EL - Ethyl lactate
- EP Ethyl pyruvate
- IPA - Isopropyl intoxicant
- MAK - 2-heptanone
- MEK - Methyl ethyl ketone
- MMP - Methyl 3-methoxypropionate
- NMP - N-Methylpyrrolidone
- PGMEA - Propylene glycol monomethyl ether acetate
- Xylene
Download now to limb yourself with this nearby engineering-focused Microlithography Filtration Filtration PDA Remark compliments of Gloom Microelectronics. |